As per the latest report by IMARC Group, titled “Photoresist and Photoresist Ancillaries Market: Global Industry Trends, Share, Size, Growth, Opportunity and Forecast 2021-2026”, offers a comprehensive analysis of the industry, which comprises insights on . The report also includes competitor and regional analysis, and contemporary advancements in the global market. The global photoresist and photoresist ancillaries market reached a value of US$ 3.88 Billion in 2020. Looking forward, IMARC Group expects the market to exhibit moderate growth during 2021-2026.
A photoresist is a light-sensitive material which alters its chemical structure on exposure to ultraviolet light. It is of two kinds, namely, positive and negative. In positive photoresists, the photo-sensitive material is degraded by light and the developer dissolves away the regions exposed to sunlight. In contrast, negative photoresists become cross-linked and insoluble on exposure to UV light. Photoresist ancillaries are used along with photoresists to be widely utilized as removers, anti-reflective coatings, and developers.
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Market Trends:
The global market is majorly driven by the increasing application of the product in the semiconductor industry. In line with this, the rising use of flat-panel displays is significantly contributing to the market growth. Apart from this, the growing utilization of photoresists in wiring configuration is catalyzing the market growth. Moreover, rapid technological advancements in display technology are propelling the product adoption across the globe. Besides this, the increasing demand for high-performance, compact consumer electronic products, such as smartphones and tablets, game devices, and high-speed servers, are also strengthening the demand for photoresist and photoresist ancillaries.
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Competitive Landscape with Key players:
The report has also analysed the competitive landscape of the market with some of the key players being.
- Tokyo Ohka Kogyo Co., Ltd.
- JSR Corporation
- DowDuPont
- Shin-Etsu Chemical Co. Ltd.
- Fujifilm Electronics Materials Co., Ltd.
- Sumitomo Chemical Co., Ltd.
- Merck Az Electronics Materials
- Allresist GmbH
- Avantor Performance Materials, LLC
- Microchemicals GmbH
Photoresist and Photoresist Ancillaries Market Segmentation:
Our report has categorized the market based on region, type and application.
Breakup by Type:
- KrF
- ArF dry
- ArF immersion
- g- and i-line
Breakup by Application:
- Semiconductors
- Integrated Compound Semiconductors (ICS)
- Liquid Crystal Display (LCD)
- Printed circuit boards
- Others
Breakup by Region:
- North America (United States, Canada)
- Europe (Germany, France, United Kingdom, Italy, Spain, Others)
- Asia Pacific (China, Japan, India, Australia, Indonesia, Korea, Others)
- Latin America (Brazil, Mexico, Others)
- Middle East and Africa (United Arab Emirates, Saudi Arabia, Qatar, Iraq, Other)
Key highlights of the report:
- Market Performance
- Market Outlook
- Porter’s Five Forces Analysis
- Market Drivers and Success Factors
- SWOT Analysis
- Value Chain
- Comprehensive Mapping of the Competitive Landscape
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